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Sts 310 pecvd (plasmafab PF310)
Sts 310 pecvd (plasmafab PF310)
STS 310 PECVD (Plasmafab PF310) Deposition System comprises of a Power Supply Console, the Deposition main frame and the Monitor trolley complete with keyboard.
STS310 PECVD is controlled by an Intel 8085A microprocessor to create plasma reaction conditions within the Vacuum Chamber for the deposition process.
Each Deposition Program, of which there are three, has a sequence of processes which can be controlled through the microprocessor in any order. There are ten process pages which are programmed into the microprocessor, but these are reduced to seven should an annealing process be required.
A Mimic Display Page shows STS 310 PECVD operating during the “start-up and process time†and instruct the operator when to open the chamber lid, by operating the two pushbuttons, on the front panel to either place the substrate in the chamber at the start of the process or to remove the substrate at the end of the process. “Fault flags†are displayed should any malfunction occur during the process. This may be a process gas valve not functioning, loss of process gas, loss of compressed air, R.F. supply not on etc.
Automatic start up and shutdown procedures are programmed into STS 310 enabling the operator to control the state of the system at all times.
A Roots/Rotary Pump combination is used to evacuate the process chamber. Dry Nitrogen ballasting is encorporated into the pumping system to prevent the majority of any corrosive gases condensing during the compression cycle of the pump and also to dilute any particulate in the oil box.
The Power Supply Console is free standing, and may be sited adjacent to the Deposition main frame, or in area the area behind the clean room should this type of environment be selected. Interconnect cables and hoses are provided for the connection between the two main units. The air cooled console houses the R.F. Power to the electrodes, the heater power supply, the microprocessor and all the sub-units necessary for processing. The monitor and operator control panel/keyboard of STS 310 PECVD can be positioned on a convenient work station or desk. Interconnect cables are supplied between the main frame and monitor, and the control panel.
208/220V 3 phase and neutral 30A per phase
Demineralised or distalled water is recommended. If unavailable, tap water can be used if it has a minimum specific resistance of 10K ohms-centimeter. The solid content must be less than 30 ppm and a pH value of 6.0-7.5.
Maximum inlet temperature 25℃.
To suit process requirements 5 psi to
Supplies must be connected with stainless steel pipework.
187.5 KHz, 500 watts or 1000 watts output
Up to 360℃.(2KW HEATER) with P.I.D. Control
Intel 8085 microprocessor based system with VDU display and keyboard control.
Ten Deposition Processes or Seven Deposition Processes and three Anneal Processes.
Up to 59 minutes 59 seconds for each process.
Combined with Allwin21 Corp Superior Temperature Control Technologyand AW Control Software, upgraded STS 310 PECVD provides significant advantages over the original systems:
l New hardware includes: New control Board with cable, new timer counter with watch dog, Pentium Computer with 17†LCD Monitor, standard keyboard and mouse.
l Software calibration and easy to be done.
l More functions and I/O hardware “exposed†for easier maintenance and trouble shooting.
l It is easy to edit recipe with GUI and graph display.
l Save all process data on the computer hard disk.
l A/D and D/A precision is 14 to 16 bits.
l Detect in process and with color curve displayed on the screen.
l Software watch dog to eliminate machine damage duo to the computer locks up or freeze.
l Sensor status detect function.
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